RELATIVE SENSITIVITY FACTORS FOR SUBMICRON SECONDARY-ION MASS-SPECTROMETRY WITH GALLIUM PRIMARY ION-BEAM

被引：11

作者：

SATOH, H ^{[1
]}

OWARI, M ^{[1
]}

NIHEI, Y ^{[1
]}

机构：

[1] UNIV TOKYO,INST IND SCI,MINATO KU,TOKYO 106,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 08期

关键词：

SECONDARY ION MASS SPECTROMETRY; FOCUSED ION BEAM; GALLIUM; RELATIVE SENSITIVITY FACTOR; QUANTITATIVE ANALYSIS;

D O I：

10.1143/JJAP.32.3616

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Relative sensitivity factors (RSFs) of thirteen elements in the oxide glass matrix in secondary ion mass spectrometry (SIMS) excited by a gallium focused ion beam were determined. RSFs were obtained by analyzing powder particles of standard glass samples. Whole volumes of each particles were analyzed in the ''shave-off '' mode in order to avoid topographic effects. Reproducibility of RSFs was good, and sample-to-sample scattering of values was relatively small. Dependence of RS Fs on the first ionization potential was shown to be reasonable. In order to check the validity of the RSFs, coal fly ash particles were analyzed. The results were in reasonable agreement with the data obtained through the bulk chemical analysis.

引用

页码：3616 / 3620

页数：5

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