MICROSTRUCTURE OF ZNO FILMS PRODUCED BY REACTIVE DC SPUTTERING TECHNIQUE

被引：34
作者：
GHOSH, S
SARKAR, A
BHATTACHARYA, S
CHAUDHURI, S
PAL, AK
机构：
[1] Department of Materials Science, Indian Association for the Cultivation of Science, Calcutta
来源：
JOURNAL OF CRYSTAL GROWTH | 1991年 / 108卷 / 3-4期
关键词：
D O I：
10.1016/0022-0248(91)90231-S
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
The effect of grain growth of zinc oxide films deposited by using a reactive DC magnetron sputtering technique was studied as a function of annealing temperature. The results are correlated with the observed electrical and optical studies.
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页码：534 / 540
页数：7
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