NONEQUILIBRIUM IN METALLIC MICROSTRUCTURES IN THE PRESENCE OF HIGH-CURRENT DENSITY

被引:75
作者
BERGMANN, G [1 ]
WEI, W [1 ]
ZOU, Y [1 ]
MUELLER, RM [1 ]
机构
[1] FORSCHUNGSZENTRUM JULICH, INST FESTKORPERFORSCH, W-5170 JULICH 1, GERMANY
来源
PHYSICAL REVIEW B | 1990年 / 41卷 / 11期
关键词
D O I
10.1103/PhysRevB.41.7386
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thin narrow films with a cross section of about 10-10 cm2 have been studied under nonequilibrium conditions. Working at liquid-helium temperature, with current densities up to 107 A/cm2, corresponding to electric fields up to 0.3×106 V/m, we raised the electron temperature Te considerably above the phonon temperature Tph. We tried to use weak localization and the Coulomb anomaly of the resistance as thermometers. Weak localization worked very well, but in the case of the Coulomb anomaly we found inconsistencies. We predict that the Coulomb anomaly shows non-ohmic behavior. Our experimental data suggest an Eliashberg function +2F() which is linear in . We can give upper limits for the escape time of the phonons from the film into the quartz. The evaluation with our weak-localization thermometer yields consistent results. © 1990 The American Physical Society.
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页码:7386 / 7396
页数:11
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