COMPARATIVE STUDY OF PLASMA ANODIZATION OF SILICON IN A COLUMN OF A DC GLOW DISCHARGE

被引:25
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COPELAND, MA
PAPPU, R
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10.1063/1.1653882
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O59 [应用物理学];
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页码:199 / &
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共 6 条
[1]  
FLUGGE S, 1956, HDB PHYSIK, V22, P62
[2]   THE FORMATION OF METAL OXIDE FILMS USING GASEOUS AND SOLID ELECTROLYTES [J].
MILES, JL ;
SMITH, PH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (12) :1240-1245
[3]  
OHANLON JF, 1970, RC2889 IBM RES CTR T
[4]  
OHANLON JF, PRIVATE COMMUNICATIO
[5]  
PULFREY DL, UNPUBLISHED
[6]  
RAMASUBRAHMANIA.N, 1970, ELECTROCHEM SOC, V117, P947