X-RAY-DIFFRACTION AND ELECTRON-MICROSCOPY STUDY OF CR/SB MULTILAYERED FILMS

被引:3
作者
DOHNOMAE, H [1 ]
机构
[1] KYOTO UNIV,INST CHEM RES,UJI,KYOTO 611,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 3A期
关键词
METALLIC MULTILAYER; CROSS-SECTIONAL TEM; LATTICE IMAGE; INTERFACIAL REACTION; EPITAXIAL GROWTH; MONOATOMIC LAYER;
D O I
10.1143/JJAP.33.1499
中图分类号
O59 [应用物理学];
学科分类号
摘要
Structures of [Cr(2 angstrom)/Sb(50 angstrom)]n multilayered films have been investigated by X-ray diffraction and transmission electron microscopy (TEM) of cross sections. When the substrate temperature (T(s)) was 90-degrees-C, an epitaxial structure with a coherent stacking of Sb and compound (CrSb) layers was formed by the interfacial reaction. On the other hand, at T(s) = -50-degrees-C, a non-epitaxial structure composed of crystalline Sb layers and amorphous Cr metal layers was obtained. Interfaces of multilayers observed by TEM are very flat for both samples. The structures of very thin Cr layers depend on the reactivity of interfaces and greatly affect on the orientations of Sb layers.
引用
收藏
页码:1499 / 1508
页数:10
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