ALUMINUM AND ALUMINUM-ALLOY SPUTTER DEPOSITION FOR VLSI

被引：0
|
作者：
HARTSOUGH, LD
DENISON, DR
机构：
来源：
SOLID STATE TECHNOLOGY | 1979年 / 22卷 / 12期
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：66 / 72
页数：7
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