CONTROL COMPOSITION STUDY OF SPUTTERED NI-TI SHAPE-MEMORY ALLOY FILM

被引：26
作者：
BENDAHAN, M
CANET, P
SEGUIN, JL
CARCHANO, H
机构：
[1] Laboratoire d'Electronique et de Physico-chimie des Couches Minces, Faculté des Sciences de Saint-Jérôme, Service A62
来源：
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1995年 / 34卷 / 2-3期
关键词：
SHAPE MEMORY ALLOY; SPUTTERING; THIN FILM; NI-TI;
D O I：
10.1016/0921-5107(95)01237-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Since the transition temperature of the shape memory effect in NixTi1-x films depends on the composition of the layer, it is indispensable to have an accurate control on their composition. We are now able to control in situ the composition of r.f. sputtered Ni-Ti films in the whole domain of shape memory effect (0.476 < x < 0.531). by varying the product of sputtering gas pressure P and target-to-substrate distance d. Pressure measurements are found to give a good sensitivity for the control of Ti-rich layers, while the optical emission spectroscopy of the sputtering plasma gives better sensitivity for Ni-rich layers.
引用
收藏
页码：112 / 115
页数：4
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