ROLE OF ARGON INVOLVED IN PLASMA-DEPOSITED AMORPHOUS SI-H FILMS

被引：41

作者：

TANAKA, K

YAMASAKI, S

NAKAGAWA, K

MATSUDA, A

OKUSHI, H

MATSUMURA, M

IIZIMA, S

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1980年 / 35-6卷 / JAN-期

关键词：

D O I：

10.1016/0022-3093(80)90640-7

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：475 / 480

页数：6

共 9 条

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[2]

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[3]

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[6]

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[7] NEW DEVELOPMENT IN STUDY OF AMORPHOUS SILICON HYDROGEN ALLOYS - STORY OF O [J].

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PAUL, W .

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[8] SUBSTITUTIONAL DOPING OF AMORPHOUS SILICON [J].

SPEAR, WE ;

LECOMBER, PG .

SOLID STATE COMMUNICATIONS, 1975, 17 (09) :1193-1196

[9] EFFECT OF ANNEALING ON THE OPTICAL-PROPERTIES OF PLASMA DEPOSITED AMORPHOUS HYDROGENATED SILICON [J].

TSAI, CC ;

FRITZSCHE, H .

SOLAR ENERGY MATERIALS, 1979, 1 (1-2) :29-42

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