CHARACTERIZATION OF SILVER COATINGS DEPOSITED FROM A HOLLOW-CATHODE SOURCE

被引：28

作者：

MAH, G ^{[1
]}

MCLEOD, PS ^{[1
]}

WILLIAMS, DG ^{[1
]}

机构：

[1] DOW CHEM,ROCKY FLATS DIV,POB 888,GOLDEN,CO 80401

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 04期

关键词：

D O I：

10.1116/1.1312731

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：663 / 665

页数：3

共 11 条

[1]

BLAND RD, 1972, SCDR720922 SAND LAB

[2]

Chopra K.L, 1969, THIN FILM PHENOMENA

[3] GROWTH OF THIN METAL FILMS UNDER APPLIED ELECTRIC FIELD (VACUUM DEPOSITION COALESCENCE OF NUCLEI E) [J].

CHOPRA, KL .

APPLIED PHYSICS LETTERS, 1965, 7 (05) :140-+

[4]

DHEURLE FM, 1966, T METALL SOC AIME, V236, P321

[5] STRUCTURE MODIFICATION BY ION-BOMBARDMENT DURING DEPOSITION [J].

MATTOX, DM ;

KOMINIAK, GJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01) :528-&

[6] EFFECT OF SUBSTRATE BIAS VOLTAGE ON BONDING OF EVAPORATED SILVER COATINGS [J].

MCLEOD, PS ;

MAH, G .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01) :119-121

[7]

MORLEY JR, 1971, Patent No. 3562141

[8] ORIENTATION EFFECTS OF AN APPLIED DC FIELD ON NACL FILMS DEPOSITED ON SILICA GLASS [J].

SINCLAIR, WR ;

CALBICK, CJ .

APPLIED PHYSICS LETTERS, 1967, 10 (08) :214-&

[9] PREFERRED ORIENTATION IN BIAS-SPUTTERED NICKEL CHROMIUM FILMS [J].

STERN, E ;

LIGHT, TB .

APPLIED PHYSICS LETTERS, 1968, 13 (11) :381-&

[10] VACUUM COATING WITH A HOLLOW-CATHODE SOURCE [J].

WILLIAMS, DG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01) :374-376

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