INTERFACIAL CHARGE MODIFICATION BETWEEN SIO2 AND SILICON

被引：3
|
作者：
ARONOWITZ, S [1 ]
ZAPPE, HP [1 ]
HU, C [1 ]
机构：
[1] UNIV CALIF BERKELEY,DEPT ELECT ENGN,BERKELEY,CA 94720
来源：
APPLIED PHYSICS LETTERS | 1989年 / 54卷 / 14期
关键词：
D O I：
10.1063/1.101400
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1317 / 1319
页数：3
相关论文
共 50 条
  • [1] MODIFICATION OF INTERFACIAL CHARGE BETWEEN SIO2 AND SILICON
    ARONOWITZ, S
    ANAND, K
    RIGA, G
    APPLIED PHYSICS LETTERS, 1988, 52 (11) : 913 - 915
  • [2] EFFECTIVE CHARGE MODIFICATION BETWEEN SIO2 AND SILICON
    ARONOWITZ, S
    ZAPPE, HP
    HU, C
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (08) : 2368 - 2370
  • [3] Study on Interfacial SiO2 Layer of Silicon Direct Bonding
    He Jin
    半导体学报, 1999, (04) : 3 - 5
  • [4] MODIFICATION OF SIO2
    OVSHINSKY, SR
    SAPRU, K
    FLASCK, RA
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1978, 23 (03): : 461 - 461
  • [5] Charge transport and electroluminescence of silicon nanocrystals/SiO2 superlattices
    Lopez-Vidrier, J.
    Berencen, Y.
    Hernandez, S.
    Blazquez, O.
    Gutsch, S.
    Laube, J.
    Hiller, D.
    Loeper, P.
    Schnabel, M.
    Janz, S.
    Zacharias, M.
    Garrido, B.
    JOURNAL OF APPLIED PHYSICS, 2013, 114 (16)
  • [6] Researching the silicon direct wafer bonding with interfacial SiO2 layer
    王小青
    俞育德
    宁瑾
    Journal of Semiconductors, 2016, (05) : 125 - 128
  • [7] Enhancing the Interfacial Property Between UHMWPE Fibers and Epoxy Through Polydopamine and SiO2 Surface Modification
    Ben, Nengjun
    Jiang, Sulun
    Zhao, Liping
    Gong, Jiale
    Shen, Lu
    Wang, Kui
    Tang, Chenyang
    CHEMISTRYOPEN, 2025, 14 (01):
  • [8] Researching the silicon direct wafer bonding with interfacial SiO2 layer
    Wang Xiaoqing
    Yu Yude
    Ning Jin
    JOURNAL OF SEMICONDUCTORS, 2016, 37 (05)
  • [9] Study on the interfacial SiO2 layer of silicon wafer direct bonding
    Jin, H
    Xin, W
    Xing, BC
    1998 5TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY PROCEEDINGS, 1998, : 765 - 767
  • [10] Interfacial Reactions between Si and SiO2 with Ceramic Additives
    Chen, Yu-Hsiang
    Lin, Kun-Lin
    Lin, Chien-Cheng
    CERAMICS-SWITZERLAND, 2022, 5 (01): : 44 - 54
12345