PARAMAGNETIC SUSCEPTIBILITY OF AN INTERACTING ELECTRON-GAS AT METALLIC DENSITIES

被引：45
作者：
VASHISHTA, P
SINGWI, KS
机构：
[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HEIGHTS, NY 10598 USA
[2] NORTHWESTERN UNIV, PHYS DEPT, EVANSTON, IL 60201 USA
[3] ARGONNE NATL LAB, ARGONNE, IL 60439 USA
来源：
SOLID STATE COMMUNICATIONS | 1973年 / 13卷 / 07期
关键词：
D O I：
10.1016/0038-1098(73)90395-5
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
引用
收藏
页码：901 / 904
页数：4
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