CURRENT EFFICIENCY IN PLASMA ANODIZATION OF ALUMINUM

被引：12

作者：

ANDO, K

MATSUMURA, K

机构：

来源：

THIN SOLID FILMS | 1978年 / 52卷 / 02期

关键词：

D O I：

10.1016/0040-6090(78)90135-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：153 / 162

页数：10

共 13 条

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[5] IONIC CURRENT AS A FUNCTION OF FIELD IN OXIDE DURING PLASMA ANODIZATION OF TANTALUM AND NIOBIUM [J].

LEE, WL ;

OLIVE, G ;

PULFREY, DL ;

YOUNG, L .

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[6] PLASMA ANODIZATION OF METALS AND SEMICONDUCTORS [J].

OHANLON, JF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1970, 7 (02) :330-&

[7] NEW TECHNIQUE FOR HIGH-SPEED ANODIZATION IN A DC OXYGEN GLOW-DISCHARGE [J].

OHANLON, JF ;

SAMPOGNA, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (03) :450-452

[8] ROLE OF PLASMA NEGATIVE-IONS IN PLASMA ANODIZATION [J].

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PULFREY, DL .

THIN SOLID FILMS, 1972, 12 (02) :427-&

[9]

PULFREY DL, 1971, AFALTR70328 US AIR F

[10] ELECTRON ENERGY DISTRIBUTIONS IN PLASMAS .4. OXYGEN AND NITROGEN [J].

THOMPSON, JB .

PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1961, 262 (1310) :503-+

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