EFFECTS OF DEPOSITION PARAMETERS ON PROPERTIES OF RF SPUTTERED MOLYBDENUM FILMS

被引：28

作者：

NOWICKI, RS

BUCKLEY, WD

MACKINTOSH, WD

MITCHELL, IV

机构：

[1] ENERGY CONVERSION DEVICES INC, TROY, MI 48084 USA

[2] CHALK RIVER NUCL LABS, CHALK RIVER K0J IJ0, ONTARIO, CANADA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 04期

关键词：

D O I：

10.1116/1.1312734

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：675 / 679

页数：5

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