共 50 条
[32]
A FOCUSED ION-BEAM SYSTEM FOR SUB-MICRON LITHOGRAPHY
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1985, 3 (01)
:41-44
[33]
X-RAY-SENSITIVE RESISTS FOR SUB-MICRON LITHOGRAPHY
[J].
SOVIET MICROELECTRONICS,
1983, 12 (01)
:1-8
[36]
PATTERN FIDELITY IN SUB-MICRON LITHOGRAPHY WITH A RECTANGULAR ELECTRON-BEAM
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1983, 22 (08)
:1335-1341
[37]
CHARACTERIZATION TECHNIQUES FOR X-RAY-LITHOGRAPHY SUB-MICRON METROLOGY
[J].
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS,
1984, 471
:103-109
[38]
A SUB-MICRON ELECTRON-BEAM LITHOGRAPHY SYSTEM FOR LABORATORY USE
[J].
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS,
1985, 537
:175-178