ALTERNATIVE MODEL OF ELECTROLYTIC CELL TO QUANTIFY THE MACRO THROWING POWER OF PLATING SOLUTIONS

被引:0
作者
GANA, R
CONTRERAS, MP
FIGUEROA, M
KATTAN, L
机构
来源
BOLETIN DE LA SOCIEDAD CHILENA DE QUIMICA | 1991年 / 36卷 / 03期
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中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
A modified slot cell was designed and built for the throwing power (pi) determination of plating electrolytes. This proposed cell does not need any special equipment for the measurement of the deposit thickness; this measurement is necessary to obtain pi when the conventional cell is used. In the modified slot cell, the experimental data are obtained by measurement of metal weight increase of two narrow and light plate cathodes. A mathematical expression was derived for the relation between the throwing power (pi) and the deposited copper on the cathodic plates; a good reproducibility was obtained in a 0 to 100 scale.
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页码:189 / 194
页数:6
相关论文
共 8 条
  • [1] GRAHAM AK, 1987, MANUAL INGENIERIA RE, pCH16
  • [2] HARING HE, 1923, T ELECTROCHEM SOC, V44, P313
  • [3] Lowenheim F.A., 1974, MODERN ELECTROPLATIN
  • [4] MACHU W, 1959, GALVANOTECNIA MODERN, pCHR7
  • [5] MOHLER JB, 1959, MET FINISH, V57, P57
  • [6] Nohse W., 1966, HULL CELL
  • [7] PINNER R, 1964, COPPER COPPER ALLOY, P66
  • [8] Rousselot, 1959, REPARTITION POTENTIA