COSPUTTERED MOLYBDENUM SILICIDES ON THERMAL SIO2

被引：36

作者：

MURARKA, SP

FRASER, DB

RETAJCZYK, TF

SHENG, TT

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 10期

关键词：

D O I：

10.1063/1.327454

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5380 / 5385

页数：6

共 19 条

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JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) :342-349

[9] SILICIDE FORMATION IN THIN CO-SPUTTERED (TITANIUM + SILICON) FILMS ON POLYCRYSTALLINE SILICON AND SIO2 [J].

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