CHARACTERIZATION OF ALUMINUM-BASED OXIDE LAYERS FORMED BY MICROWAVE PLASMA

被引：25

作者：

KATZTSAMERET, Z ^{[1
]}

RAVEH, A ^{[1
]}

机构：

[1] NUCL RES CTR NEGEV, DIV CHEM, IL-84190 BEER SHEVA, ISRAEL

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1995年 / 13卷 / 03期

关键词：

D O I：

10.1116/1.579597

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1121 / 1127

页数：7

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