EFFECTS OF PHOTOELECTRON MIGRATION ON X-RAY DEPOSITION IN COMPOSITE-MATERIALS

被引：0
|
作者：
PARKS, DE [1 ]
FISHER, RH [1 ]
机构：
[1] SYST SCI & SOFTWARE, LAJOLLA, CA 92037 USA
来源：
TRANSACTIONS OF THE AMERICAN NUCLEAR SOCIETY | 1973年 / 16卷 / JUN期
关键词：
D O I：
暂无
中图分类号：
TL [原子能技术]; O571 [原子核物理学];
学科分类号：
0827 ; 082701 ;
摘要：
引用
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页码：355 / 355
页数：1
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