EFFECTS OF PHOTOELECTRON MIGRATION ON X-RAY DEPOSITION IN COMPOSITE-MATERIALS

被引：0

作者：

PARKS, DE ^{[1
]}

FISHER, RH ^{[1
]}

机构：

[1] SYST SCI & SOFTWARE, LAJOLLA, CA 92037 USA

来源：

TRANSACTIONS OF THE AMERICAN NUCLEAR SOCIETY | 1973年 / 16卷 / JUN期

关键词：

D O I：

暂无

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

引用

页码：355 / 355

页数：1

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