THIN-FILMS OF AL2O3 AND TA2O5 OBTAINED BY MAGNETRON REACTIVE SPUTTERING

被引：0
|
作者：
MUTIHAC, R [1 ]
OPREA, A [1 ]
机构：
[1] INST PHYS & TECHNOL MAT BUCHAREST MAGURELE,BUCHAREST,ROMANIA
来源：
REVUE ROUMAINE DE CHIMIE | 1991年 / 36卷 / 1-3期
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
A magnetron with 75 cm2 effective area for reactive sputtering in pure oxygen was realised by modifying AV 500 standard equipment. Dielectric Al2O3 and Ta2O5 thin films of 30 cm2 area and thickness between 0.1-1-mu-m were obtained. Their amorphous structure and excellent visible transmission recommend them for electroluminescent devices production.1-3
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页码：49 / 54
页数：6
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