PROPERTIES OF ALL-NB THIN-FILM MICROBRIDGES FABRICATED BY NANOMETER PROCESS

被引：2

作者：

HARADA, Y ^{[1
]}

HIROSE, N ^{[1
]}

UZAWA, Y ^{[1
]}

SEKINE, M ^{[1
]}

YOSHIMORI, S ^{[1
]}

KAWAMURA, M ^{[1
]}

机构：

[1] TAKUSHOKU UNIV,FAC ENGN,HACHIOJI,TOKYO 193,JAPAN

来源：

PHYSICA C | 1991年 / 185卷 / pt 4期

关键词：

Microbridges - Nanometer Processes;

D O I：

10.1016/0921-4534(91)91401-O

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have fabricated all-Nb thin film microbridges by using newly developed nanometer process. These microbridges show the high sensitivity of the radiation detection. We have investigated the properties of microbridges by changing the bridge-region parameters.

引用

页码：2555 / 2556

页数：2