ANISOTROPIC ETCHING OF POLYCRYSTALLINE SILICON WITH A HOT CL2 MOLECULAR-BEAM

被引：42
|
作者：
SUZUKI, K
HIRAOKA, S
NISHIMATSU, S
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 07期
关键词：
D O I：
10.1063/1.341413
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：3697 / 3705
页数：9
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