共 50 条
- [21] ELECTRON-BEAM-INDUCED CL2 ETCHING OF GAAS JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1989, 28 (03): : L515 - L517
- [26] Hardmask charging during Cl2 plasma etching of silicon JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1999, 17 (06): : 3293 - 3307
- [30] VIBRATIONAL AND ROTATIONAL ENERGY-DISTRIBUTIONS IN A HOT CL-2 MOLECULAR-BEAM JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (07): : 1268 - 1271