ANISOTROPIC ETCHING OF POLYCRYSTALLINE SILICON WITH A HOT CL2 MOLECULAR-BEAM

被引:42
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作者
SUZUKI, K
HIRAOKA, S
NISHIMATSU, S
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10.1063/1.341413
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O59 [应用物理学];
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页码:3697 / 3705
页数:9
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