ANISOTROPIC-PLASMA ETCHING OF POLYSILICON

被引：0

作者：

KOIKE, A ^{[1
]}

IMAI, K ^{[1
]}

HOSODA, S ^{[1
]}

TOMOZAWA, A ^{[1
]}

AGATSUMA, T ^{[1
]}

机构：

[1] HITACHI LTD,MUSHSHI WORKS,TOKYO 187,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C105 / C105

页数：1

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