DEPOLING PHENOMENA AND STABILITY CONSIDERATIONS IN THIN FERROELECTRIC FILMS

被引：0
|
作者：
BATRA, IP [1 ]
WURFEL, P [1 ]
SILVERMA.BD [1 ]
机构：
[1] IBM CORP,RES LAB,SAN JOSE,CA
来源：
BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1973年 / 18卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
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页码：497 / 497
页数：1
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