THE FORMATION OF SIO2 IN AN RF GENERATED OXYGEN PLASMA .1. THE PRESSURE RANGE BELOW 10 MTORR

被引：45

作者：

RAY, AK

REISMAN, A

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 11期

关键词：

D O I：

10.1149/1.2127270

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：2460 / 2465

页数：6

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