INTRINSIC DIFFUSION OF BORON AND PHOSPHORUS IN SILICON FREE FROM SURFACE EFFECTS

被引：74

|

作者：

GHOSHTAGORE, RN

机构：

来源：

PHYSICAL REVIEW B-SOLID STATE | 1971年 / 3卷 / 02期

关键词：

D O I：

10.1103/PhysRevB.3.389

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

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页码：389 / +

页数：1

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