SI DIFFUSION PROCESS FOR A COPLANAR STRUCTURE LASER DIODE FOR OPTOELECTRONIC INTEGRATED-CIRCUITS

被引：0
|
作者：
TAKAHASHI, S
GOTO, K
UESUGI, H
NISHIGUCHI, H
OMURA, E
NAMIZAKI, H
机构：
来源：
FIRST INTERNATIONAL MEETING ON ADVANCED PROCESSING AND CHARACTERIZATION TECHNOLOGIES: FABRICATION AND CHARACTERIZATION OF SEMICONDUCTOR OPTOELECTRONIC DEVICES AND INTEGRATED CIRCUITS, VOLS 1 AND 2 | 1989年
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：A159 / A162
页数：4
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