SI DIFFUSION PROCESS FOR A COPLANAR STRUCTURE LASER DIODE FOR OPTOELECTRONIC INTEGRATED-CIRCUITS

被引：0

作者：

TAKAHASHI, S

GOTO, K

UESUGI, H

NISHIGUCHI, H

OMURA, E

NAMIZAKI, H

机构：

来源：

FIRST INTERNATIONAL MEETING ON ADVANCED PROCESSING AND CHARACTERIZATION TECHNOLOGIES: FABRICATION AND CHARACTERIZATION OF SEMICONDUCTOR OPTOELECTRONIC DEVICES AND INTEGRATED CIRCUITS, VOLS 1 AND 2 | 1989年

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D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：A159 / A162

页数：4

共 50 条

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[32] PROCESS AND DEVICE MODELING FOR THE DEVELOPMENT OF INTEGRATED-CIRCUITS
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