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- [21] THE 248-NM PHOTOFRAGMENTATION OF THE CH3O2 RADICALJOURNAL OF PHYSICAL CHEMISTRY, 1990, 94 (07): : 2963 - 2966HARTMANN, DKARTHAUSER, JZELLNER, R
- [22] Influence of air humidity on 248-nm ultraviolet laser pulse filamentationOPTICS LETTERS, 2019, 44 (09) : 2165 - 2168Shutov, Alexey, VMokrousova, Daria, VFedorov, Vladimir YuSeleznev, Leonid, VRizaev, Georgy E.Shalova, Anna, VZvorykin, Vladimir D.Tzortzakis, SteliosIonin, Andrey A.
- [23] MULTIPHOTON IONIZATION OF HYDROGEN BY AN INTENSE 248-NM LINEARLY POLARIZED FIELDPHYSICAL REVIEW A, 1991, 43 (01): : 439 - 442PINDZOLA, MSDORR, M
- [24] MULTI-PHOTON PHOTOFRAGMENTATION OF SO2 AT 248-NMJOURNAL OF CHEMICAL PHYSICS, 1982, 77 (04): : 1837 - 1841WILSON, MWROTHSCHILD, MMULLER, DFRHODES, CK
- [25] The Cl to NCl branching ratio in 248-nm photolysis of chlorine azideCHEMICAL PHYSICS LETTERS, 2004, 391 (4-6) : 334 - 337Wodtke, AMHansen, NRobinson, JCSveum, NEGoncher, SJNeumark, DM
- [26] A novel 248-nm wet-developable BARC for trench applicationsADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIV, 2007, 6519Neef, Charles J.Thomas, Deborah
- [27] COLLISIONAL DEACTIVATION OF HIGHLY VIBRATIONALLY EXCITED BENZENE PUMPED AT 248-NMJOURNAL OF PHYSICAL CHEMISTRY, 1990, 94 (16): : 6341 - 6350YERRAM, MLBRENNER, JDKING, KDBARKER, JR
- [28] Contact printing to the 45-nm node using a binary mask and 248-nm lithographyADVANCES IN RESIST TECHNOLOGY AND PROCESSING XX, PTS 1 AND 2, 2003, 5039 : 277 - 290Suhm, KEBaker, DCHesse, BClark, KColeman, S
- [29] 2-PHOTON DISSOCIATION OF SULFUR-DIOXIDE AT 248-NM AND 308-NMCHEMICAL PHYSICS, 1990, 142 (02) : 311 - 320EFFENHAUSER, CSFELDER, PHUBER, JR
- [30] Spectroscopic characterization of acid mobility in 248-nm chemically amplified resists.ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2000, 219 : U473 - U473Jessop, JLPGoldie, SNScranton, ABBlanchard, GJ