MATRIX-ISOLATION STUDY OF VACUUM-ULTRAVIOLET PHOTOLYSIS OF DICHLOROSILANE . INFRARED SPECTRUM OF FREE RADICAL SICL2

In studies of the vacuum-ultra violet photolysis of SiH2Cl 2 and of SiD2Cl2 suspended in an argon matrix at 14°K, new absorptions appear at 502 and at 513 cm-1 which may be assigned as the two stretching fundamentals of SiCl2. A broad, unstructured absorption is also observed in the region of the ultraviolet spectrum in which features tentatively ascribed to SiCl2 were observed in earlier gas-phase emission studies. The detailed assignment of the observed infrared features is considered, and values of the valence angle, the Si-Cl stretching force constant, and the stretching-interaction force constant are estimated, corresponding to the two possible assignments for the infrared absorptions.