ANALYSIS OF 2-DIMENSIONAL ETCHING EFFECT ON PROFILES OF FINE HOLOGRAPHIC GRATING MADE OF POSITIVE PHOTORESIST AZ2400

被引：3

作者：

KODATE, K ^{[1
]}

KAMIYA, T ^{[1
]}

TAKENAKA, H ^{[1
]}

YANAI, H ^{[1
]}

机构：

[1] UNIV TOKYO,DEPT ELECT ENGN,BUNKYO KU,TOKYO 113,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1978年 / 17卷

关键词：

D O I：

10.7567/JJAPS.17S1.121

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：121 / 126

页数：6

共 9 条

[1] FABRICATION OF THIN PERIODIC STRUCTURES IN PHOTORESIST - MODEL [J].

AUSTIN, S ;

STONE, FT .

APPLIED OPTICS, 1976, 15 (04) :1071-1074

[2]

AUSTIN S, 1976, APPL OPTICS, V15, P2120

[3] CHARACTERISTICS OF RELIEF PHASE HOLOGRAMS RECORDED IN PHOTORESISTS [J].

BARTOLINI, RA .

APPLIED OPTICS, 1974, 13 (01) :129-139

[4] CHARACTERIZATION OF POSITIVE PHOTORESIST [J].

DILL, FH ;

HORNBERGER, WP ;

HAUGE, PS ;

SHAW, JM .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :445-452

[5] CHARACTERISTICS OF A PHOTORESIST HOLOGRAM AND ITS REPLICA [J].

IWATA, F ;

TSUJIUCHI, J .

APPLIED OPTICS, 1974, 13 (06) :1327-1336

[6] DOUBLE DIFFRACTION OF HOLOGRAPHIC PHASE GRATING AND ITS APPLICATION TO DISPLACEMENT MEASUREMENTS [J].

KODATE, K ;

KAMIYA, T ;

TAKENAKA, H ;

YANAI, H .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1975, 14 :475-480

[7]

Kogelnik H., 1970, Bell System Technical Journal, V49, P1602

[8] DESIGN AND PERFORMANCE OF HOLOGRAPHIC CONCAVE GRATINGS [J].

NAMIOKA, T ;

SEYA, M ;

NODA, H .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1976, 15 (07) :1181-1197

[9]

Yen H. W., 1973, Optics Communications, V9, P35, DOI 10.1016/0030-4018(73)90330-1

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