DEPOSITION AND PROPERTIES OF TITANIUM NITRIDE FILMS PRODUCED BY DC REACTIVE MAGNETRON SPUTTERING

被引：29

作者：

MENG, LJ ^{[1
]}

AZEVEDO, A ^{[1
]}

DOSSANTOS, MP ^{[1
]}

机构：

[1] UNIV MINHO,DEPT GEOL,P-4719 BRAGA,PORTUGAL

来源：

VACUUM | 1995年 / 46卷 / 03期

关键词：

D O I：

10.1016/0042-207X(94)00052-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Titanium nitride films were prepared on glass substrates by dc reactive magnetron sputtering from a titanium metal target in an Ar+N-2 mixed atmosphere. During deposition, the total pressure was varied from 2x10(-3) to 3x10(-2) mbar. The effects of the total pressure on the structural, optical and electrical properties of the films were studied using X-ray diffraction, scanning electron microscopy, reflectance spectra and resistivity measurements.

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页码：233 / 239

页数：7

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