C-AXIS-ORIENTED PB(ZR, TI)O3 THIN-FILMS PREPARED BY DIGITAL METALORGANIC CHEMICAL-VAPOR-DEPOSITION METHOD

被引:10
作者
SOTOME, Y
SENZAKI, J
MORITA, S
TANIMOTO, S
HIRAI, T
UENO, T
KUROIWA, K
TARUI, Y
机构
[1] SHARP CO LTD,INTEGRATED CIRCUIT GRP,VLSI DEV LAB,TENRI 632,JAPAN
[2] NISSAN MOTOR CO LTD,ELECTR RES LAB,YOKOSUKA,KANAGAWA 237,JAPAN
[3] ASAHI CHEM IND CO LTD,LSL LAB,FUJI,SHIZUOKA 416,JAPAN
[4] WASEDA UNIV,SCH SCI & ENGN,TOKYO,TOKYO 169,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 7A期
关键词
FERROELECTRICS; PZT; PEROVSKITE; PYROCHLORE; DIGITAL MOCVD; LAYER-BY-LAYER GROWTH;
D O I
10.1143/JJAP.33.4066
中图分类号
O59 [应用物理学];
学科分类号
摘要
Tetragonal perovskite Pb(ZrxTi(1-x)O3 (PZT) film with single c-axis orientation was successfully fabricated on a single-crystalline MgO(100) substrate at a surface temperature as low as 480-degrees-C using a ''digital metalorganic chemical vapor deposition (digital MOCVD)'' method. In this method, each metalorganic source was supplied alternately into the MOCVD reactor to prevent the formation of unexpected phases such as pyrochlore due to gas phase reaction at the low processing temperature. For layer-by-layer growth in the MOCVD method, the introduction sequence and amount of metalorganic sources supplied were adjusted to correspond to the crystal structure and density of the fabricated film. This is the first report on the fabrication of tetragonal perovskite PZT film with single c-axis orientation using the ''digital MOCVD'' method.
引用
收藏
页码:4066 / 4069
页数:4
相关论文
共 50 条
  • [41] Large area deposition of Pb(Zr,Ti)O3 thin films for piezoelectric MEMS devices
    Suchaneck, Gunnar
    Vidyarthi, Vinay S.
    Reibold, Marianne
    Deyneka, Alexander
    Jastrabik, Lubomir
    Gerlach, Gerald
    Hartung, Johannes
    JOURNAL OF ELECTROCERAMICS, 2008, 20 (01) : 17 - 20
  • [42] Effect of SrTiO3 seed layer deposition time and thickness on low-temperature crystallization and electrical properties of Pb(Zr, Ti)O3 films by metalorganic chemical vapor deposition
    Moon, Ji-Won
    Wakiya, Naoki
    Fujito, Keisuke
    Iimori, Naohiko
    Kiguchi, Takanori
    Yoshioka, Tomohiko
    Tanaka, Junzo
    Shinozaki, Kazuo
    MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2008, 148 (1-3): : 22 - 25
  • [43] Effect of ultra thin bottom electrode on the ferroelectric properties of Pb(Zr,Ti)O3 films grown by metal-organic chemical vapor deposition
    Kim, S
    Koo, JM
    Lee, JK
    Cho, CR
    Park, Y
    INTEGRATED FERROELECTRICS, 2005, 70 : 115 - 122
  • [44] Shear piezoelectric coefficient d15 of c-axis oriented epitaxial Pb(Zr,Ti)O3 films
    Kanno, Isaku
    Akama, Kenji
    Yokokawa, Ryuji
    Kotera, Hidetoshi
    2011 INTERNATIONAL SYMPOSIUM ON APPLICATIONS OF FERROELECTRICS (ISAF/PFM) AND 2011 INTERNATIONAL SYMPOSIUM ON PIEZORESPONSE FORCE MICROSCOPY AND NANOSCALE PHENOMENA IN POLAR MATERIALS, 2011,
  • [45] c-axis oriented (Na,K)NbO3 thin films on Si substrates using metalorganic chemical vapor deposition
    Cho, CR
    MATERIALS LETTERS, 2002, 57 (04) : 781 - 786
  • [46] Growth and properties of Pb(Zr0.53Ti0.47)O3 thin films
    Blanco, O
    Martínez, E
    Heiras, J
    Siqueiros, J
    Castellanos-Guzmán, AG
    MICROELECTRONICS JOURNAL, 2005, 36 (3-6) : 543 - 545
  • [47] PREPARATION OF FERROELECTRIC BI4TI3O12 THIN-FILMS WITH C-AXIS ORIENTATION BY ATMOSPHERIC-PRESSURE METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION
    YOSHIMURA, K
    ISHINABE, M
    OKAMURA, S
    TSUKAMOTO, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (5A): : 2425 - 2429
  • [48] Metalorganic chemical vapor deposition of ferroelectric Pb(ZrxTi1-x)O-3 thin films
    Chung, CW
    Kim, D
    KOREAN JOURNAL OF CHEMICAL ENGINEERING, 1997, 14 (02) : 136 - 140
  • [49] Pb(Zr0.52Ti0.48)O3 films on stainless steel by chemical solution deposition
    Özenbas, M
    Yildirim, A
    EURO CERAMICS VIII, PTS 1-3, 2004, 264-268 : 1217 - 1220
  • [50] Combinatorial preparation process of Pb(Zr1-xTix)O3 thin films by chemical solution deposition method
    He, Gang
    Iijima, Takashi
    Funakubo, Hiroshi
    JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 2009, 117 (1365) : 698 - 702