MOLECULAR-BEAM STUDIES OF SILICON ETCHING BY F2

被引：0
|
作者：
BALOOCH, M [1 ]
OLANDER, DR [1 ]
SIEKHAUS, WJ [1 ]
机构：
[1] UNIV CALIF BERKELEY,BERKELEY,CA 94720
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 8B期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C470 / C470
页数：1
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