WAVELENGTH DEPENDENCE OF EXCIMER-LASER IRRADIATION EFFECTS ON ETHYLENE-TETRAFLUOROETHYLENE COPOLYMER

被引：9
|
作者：
HAMADA, Y
KAWANISHI, S
NISHII, M
SUGIMOTO, S
YAMAMOTO, T
机构：
[1] RADIAT APPLICAT DEV ASSOC,NEYAGAWA,OSAKA 572,JAPAN
[2] OSAKA UNIV,FAC ENGN,DEPT NUCL ENGN,SUITA,OSAKA 565,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 08期
关键词：
ETHYLENE-TETRAFLUOROETHYLENE COPOLYMER; EXCIMER LASER; WAVELENGTH DEPENDENCE; IRRADIATION EFFECT; SINGLE-PHOTON ABSORPTION; MULTIPHOTON ABSORPTION; SURFACE ANALYSIS; XPS;
D O I：
10.1143/JJAP.33.4764
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Irradiation with an ArF laser at wavelength of 193 nm formed diene in a whole ethylene-tetrafluoroethylene copolymer (ETFE) film and irradiation with a KrF and a XeCl laser at 248 and 308 nm induced the carbonization of ETFE. ArF-laser radiation at 193 nm formed diene in the bulk of ETFE via the process of single-photon absorption, and in case of KrF and XeCl-laser irradiation multiphoton absorption brought about the carbonization of ETFE. The surface analysis by X-ray photoelectron spectroscopy showed that excimer laser-induced elimination of fluorine atoms depended on the laser wavelength.
引用
收藏
页码：4764 / 4768
页数：5
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