NOISE AND THERMOELECTRODYNAMIC DIAGNOSTICS OF SEMICONDUCTOR INSTRUMENTS

被引：0
|
作者：
VORONTSOV, VN
KHOLKIN, VY
机构：
来源：
RUSSIAN JOURNAL OF NONDESTRUCTIVE TESTING | 1995年 / 31卷 / 03期
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D O I：
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中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The article studies the regularities of the behavior of low-frequency noise in semiconductor instruments. We investigated the dependences of the change of low-frequency noise in real silicon semiconductor instruments with a view to the operating temperature, electrical, and frequency ranges.
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页码：220 / 222
页数：3
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