TRAPPING, DIFFUSION AND RELEASE OF HELIUM IN SINGLE-CRYSTAL TIC OBSERVED BY THERMAL-DESORPTION SPECTROMETRY

被引:6
|
作者
HOONDERT, WHB [1 ]
THIJSSE, BJ [1 ]
VANVEEN, A [1 ]
VANDENBEUKEL, A [1 ]
机构
[1] INTERFAC REACTOR INST,2629 JB DELFT,NETHERLANDS
来源
SURFACE & COATINGS TECHNOLOGY | 1992年 / 51卷 / 1-3期
关键词
D O I
10.1016/0257-8972(92)90261-8
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Using thermal desorption spectrometry (TDS), the interaction of ion-implanted helium atoms and atomic-scale defects in titanium carbide was investigated. It is found that trapping and release of helium in off-stoichiometric single-crystal TiC0.924 can be well described by a diffusive, single activation energy (2.5 eV) process. This energy is attributed to the release of a helium atom from a carbon vacancy. The experimental spectra are in excellent agreement with results obtained from diffusion theory in the presence of sinks and sources; at low implantation energies the projected range of helium is larger than the theoretical predictions and the range straggling is found to be 67 +/- 3 angstrom, independent of the implantation energy (0.1-3 keV).
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页码:338 / 342
页数:5
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