CHEMICAL VAPOR-DEPOSITED TUNGSTEN WITH DISPERSED CARBIDES FOR SPACE-SHUTTLE CHECK VALVES

被引:0
|
作者
WILLIAMS, GE
机构
来源
SAMPE QUARTERLY-SOCIETY FOR THE ADVANCEMENT OF MATERIAL AND PROCESS ENGINEERING | 1980年 / 12卷 / 01期
关键词
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:27 / 32
页数:6
相关论文
共 50 条
  • [1] MECHANICAL BEHAVIOR OF CHEMICAL VAPOR-DEPOSITED TUNGSTEN
    CHUN, JS
    SHIM, HS
    BYRNE, JG
    METALLURGICAL TRANSACTIONS, 1972, 3 (12): : 3093 - 3096
  • [2] CHEMICAL VAPOR-DEPOSITED TUNGSTEN FOR SEMICONDUCTOR METALIZATION
    MELLIARS.CM
    ADAMS, AC
    KAISER, RH
    KUSHNER, RA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (08) : C247 - C247
  • [3] PRINCIPLES OF FLUORINE DISTRIBUTION IN CHEMICAL VAPOR-DEPOSITED TUNGSTEN FILMS
    ERIKSSON, T
    OSTLING, M
    MOGYOROSI, P
    CARLSSON, JO
    KEINONEN, J
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (11) : 3267 - 3271
  • [4] INSITU STRESS MEASUREMENT OF CHEMICAL VAPOR-DEPOSITED TUNGSTEN SILICIDES
    WASHIDZU, G
    HARA, T
    MIYAMOTO, T
    INOUE, T
    APPLIED PHYSICS LETTERS, 1991, 58 (13) : 1425 - 1427
  • [5] BARRIER EFFECT OF SELECTIVE CHEMICAL VAPOR-DEPOSITED TUNGSTEN FILMS
    SHIOYA, Y
    MAEDA, M
    YANAGIDA, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (05): : 1175 - 1179
  • [6] GROWTH-KINETICS OF LASER CHEMICAL VAPOR-DEPOSITED TUNGSTEN
    SZORENYI, T
    PIGLMAYER, K
    BAUERLE, D
    SPECTROCHIMICA ACTA PART A-MOLECULAR AND BIOMOLECULAR SPECTROSCOPY, 1990, 46 (04): : 505 - 508
  • [7] VAPOR-DEPOSITED TUNGSTEN COATINGS ON GRAPHITE
    NIEBERLEIN, VA
    AMERICAN CERAMIC SOCIETY BULLETIN, 1965, 44 (01): : 14 - +
  • [8] DIFFUSION MECHANISMS IN CHEMICAL VAPOR-DEPOSITED IRIDIUM COATED ON CHEMICAL VAPOR-DEPOSITED RHENIUM
    HAMILTON, JC
    YANG, NYC
    CLIFT, WM
    BOEHME, DR
    MCCARTY, KF
    FRANKLIN, JE
    METALLURGICAL TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE, 1992, 23 (03): : 851 - 855
  • [9] Growth characteristics and electrical resistivity of chemical vapor-deposited tungsten film
    Chang, IS
    Hon, MH
    THIN SOLID FILMS, 1998, 333 (1-2) : 108 - 113
  • [10] FABRICATION AND CHARACTERIZATION OF VAPOR-DEPOSITED NIOBIUM AND ZIRCONIUM CARBIDES
    CAPUTO, AJ
    THIN SOLID FILMS, 1977, 40 (JAN) : 49 - 55