共 50 条
- [41] High-speed proximity effect correction system for electron-beam projection lithography by cluster processing JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (6B): : 3827 - 3832
- [42] 1-dimensional calculation method for proximity effect correction in cell projection electron beam direct writing EMERGING LITHOGRAPHIC TECHNOLOGIES, 1997, 3048 : 63 - 68
- [43] AN APPROACH TO CORRECT THE PROXIMITY EFFECT IN ELECTRON-BEAM PROXIMITY PRINTING JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1291 - 1295
- [45] Fabrication of Beam Sampling Gratings with Electron-Beam direct writing PRACTICAL HOLOGRAPHY XVI AND HOLOGRAPHIC MATERIALS VIII, 2002, 4659 : 413 - 419
- [46] Proximity effect correction in projection electron beam lithography (scattering with angular limitation projection electron-beam lithography) JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (12B): : 6672 - 6678
- [47] Proximity effect correction in projection electron beam lithography (scattering with angular limitation projection electron-beam lithography) Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1995, 34 (12 B): : 6672 - 6678
- [49] QUANTITATIVE LITHOGRAPHIC PERFORMANCE OF PROXIMITY CORRECTION FOR ELECTRON-BEAM LITHOGRAPHY JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (06): : 1909 - 1913