共 50 条
- [31] PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1271 - 1275
- [32] Studies on correction accuracy of proximity effect for the pattern area density method in electron beam direct writing JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06): : 3870 - 3873
- [33] Proximity effect correction by a supplementary-exposure method in the high-throughput block-exposure electron-beam direct-writing EMERGING LITHOGRAPHIC TECHNOLOGIES II, 1998, 3331 : 334 - 340
- [34] Experimental and simulation comparison of electron-beam proximity correction JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (06): : 2943 - 2947
- [35] ELECTRON-BEAM DIRECT WRITING SYSTEM EX-8D EMPLOYING CHARACTER PROJECTION EXPOSURE METHOD JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2346 - 2351
- [36] GAAS MMIC FABRICATION USING AN ELECTRON-BEAM DIRECT WRITING SYSTEM SHARP TECHNICAL JOURNAL, 1992, (53): : 55 - 58
- [37] True three-dimensional proximity effect correction in electron-beam lithography JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (06): : 3115 - 3120
- [39] Limitations of proximity-effect correction for electron-beam patterning of photonic crystals PHOTONICS: DESIGN, TECHNOLOGY, AND PACKAGING, 2004, 5277 : 186 - 197
- [40] High-speed proximity effect correction system for electron-beam projection lithography by cluster processing Ogino, K. (ogino.kouzou@jp.fujitsu.com), 1600, Japan Society of Applied Physics (42):