CIRCULAR ETCH PITS IN ION-IMPLANTED AMORPHOUS SILICON FILMS

被引：5
|
作者：
TU, KN [1 ]
TAN, SI [1 ]
CROWDER, BL [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
APPLIED PHYSICS LETTERS | 1973年 / 22卷 / 06期
关键词：
D O I：
10.1063/1.1654636
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：274 / 275
页数：2
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