PROXIMITY EFFECT CORRECTION IN ELECTRON-BEAM LITHOGRAPHY

被引：4
作者：
KATO, T
WATAKABE, Y
NAKATA, H
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期
关键词：
D O I：
10.1116/1.571260
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1279 / 1285
页数：7
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