EFFECTS OF INERT-GAS DILUTION OF SILANE ON PLASMA-DEPOSITED A-SI-H FILMS

被引：154

作者：

KNIGHTS, JC ^{[1
]}

LUJAN, RA ^{[1
]}

ROSENBLUM, MP ^{[1
]}

STREET, RA ^{[1
]}

BIEGLESEN, DK ^{[1
]}

REIMER, JA ^{[1
]}

机构：

[1] CALTECH,DIV CHEM & CHEM ENGN,PASADENA,CA 91125

来源：

APPLIED PHYSICS LETTERS | 1981年 / 38卷 / 05期

关键词：

D O I：

10.1063/1.92359

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：331 / 333

页数：3

共 50 条

[1] MICROSTRUCTURE OF PLASMA-DEPOSITED A-SI-H FILMS
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[2] DEFECTS IN PLASMA-DEPOSITED A-SI-H
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[9] SUBSTRATE DEPENDENCE OF ELECTRONIC AND STRUCTURAL-PROPERTIES OF PLASMA-DEPOSITED A-SI-H
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