DIFFUSION OF ARSENIC IN POLYCRYSTALLINE SILICON

被引：77
|
作者：
SWAMINATHAN, B [1 ]
SARASWAT, KC [1 ]
DUTTON, RW [1 ]
KAMINS, TI [1 ]
机构：
[1] HEWLETT PACKARD LABS,PALO ALTO,CA 94304
来源：
APPLIED PHYSICS LETTERS | 1982年 / 40卷 / 09期
关键词：
D O I：
10.1063/1.93263
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：795 / 798
页数：4
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