REM OBSERVATIONS OF SI(HHK) SURFACES AND THEIR VICINAL SURFACES

被引：28

作者：

SUZUKI, T ^{[1
]}

TANISHIRO, Y ^{[1
]}

MINODA, H ^{[1
]}

YAGI, K ^{[1
]}

SUZUKI, M ^{[1
]}

机构：

[1] NIPPON TELEGRAPH & TEL PUBL CORP, INTERDISCIPLINARY RES LABS, MUSASHINO, TOKYO 180, JAPAN

来源：

SURFACE SCIENCE | 1993年 / 298卷 / 2-3期

关键词：

D O I：

10.1016/0039-6028(93)90063-P

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Clean Si(hhk) surfaces and their vicinal surfaces, especially surfaces between the (113) and (114) surfaces, were studied by ultra-high vacuum reflection electron microscopy (REM) and diffraction (RHEED). The observations were carried out on inner cylindrical surfaces (0.4 mm in diameter) formed in Si(110) specimens (1 x 7 x 0.4 mm3). On the cylindrical surfaces 13 flat surfaces were recognized. REM images and RHEED patterns showed that vicinal surfaces between the (113) and (114) surfaces were composed of terraces of the (113) and (114) surfaces and the structures depended on the direction of the DC current heating the specimen.

引用

页码：473 / 477

页数：5

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