MOBILITY OF IMPURITY IONS IN GERMANIUM AND SILICON

被引:289
作者
FULLER, CS
SEVERIENS, JC
机构
来源
PHYSICAL REVIEW | 1954年 / 96卷 / 01期
关键词
D O I
10.1103/PhysRev.96.21
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:21 / 24
页数:4
相关论文
共 9 条
[1]  
FULLER, 1954, PHYS REV, V93, P1182
[2]   COPPER AS AN ACCEPTOR ELEMENT IN GERMANIUM [J].
FULLER, CS ;
STRUTHERS, JD .
PHYSICAL REVIEW, 1952, 87 (03) :526-527
[3]   DIFFUSION OF DONOR AND ACCEPTOR ELEMENTS INTO GERMANIUM [J].
FULLER, CS .
PHYSICAL REVIEW, 1952, 86 (01) :136-137
[4]   DIFFUSION OF LITHIUM INTO GERMANIUM AND SILICON [J].
FULLER, CS ;
DITZENBERGER, JA .
PHYSICAL REVIEW, 1953, 91 (01) :193-193
[5]   PROPERTIES OF THERMALLY PRODUCED ACCEPTORS IN GERMANIUM [J].
FULLER, CS ;
THEUERER, HC ;
VANROOSBROECK, W .
PHYSICAL REVIEW, 1952, 85 (04) :678-679
[6]   THE MOBILITY AND LIFE OF INJECTED HOLES AND ELECTRONS IN GERMANIUM [J].
HAYNES, JR ;
SHOCKLEY, W .
PHYSICAL REVIEW, 1951, 81 (05) :835-843
[7]  
MORIN FJ, COMMUNICATION
[8]  
PEARSON GL, 1954, Patent No. 2669692
[9]   GROWTH OF GERMANIUM SINGLE CRYSTALS CONTAINING P-N JUNCTIONS [J].
TEAL, GK ;
SPARKS, M ;
BUEHLER, E .
PHYSICAL REVIEW, 1951, 81 (04) :637-637