USE OF 111-TRICHLOROETHANE AS AN OPTIMIZED ADDITIVE TO IMPROVE SILICON THERMAL-OXIDATION TECHNOLOGY

被引：29
作者：
JANSSENS, EJ [1 ]
DECLERCK, GJ [1 ]
机构：
[1] CATHOLIC UNIV LEUVEN,DEPT ELEKTROTECH,B-3030 HEVERLE,BELGIUM
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 10期
关键词：
D O I：
10.1149/1.2131275
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1696 / 1703
页数：8
相关论文
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