PT2SI AND PTSI FORMATION WITH HIGH-PURITY PT THIN-FILMS

被引:118
作者
CANALI, C
CATELLANI, C
PRUDENZIATI, M
WADLIN, WH
EVANS, CA
机构
[1] UNIV MODENA,INST FIS,I-41100 MODENA,ITALY
[2] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
关键词
D O I
10.1063/1.89473
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:43 / 45
页数:3
相关论文
共 9 条
[1]   ROLE OF METAL-SEMICONDUCTOR INTERFACE IN SILICON INTEGRATED-CIRCUIT TECHNOLOGY [J].
ANDREWS, JM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (06) :972-984
[2]   ANALYTICAL STUDY OF PLATINUM SILICIDE FORMATION [J].
BINDELL, JB ;
COLBY, JW ;
WONSIDLER, DR ;
POATE, JM ;
CONLEY, DK ;
TISONE, TC .
THIN SOLID FILMS, 1976, 37 (03) :441-452
[3]   CHARACTERIZATION OF SILICON METALLIZATION SYSTEMS USING ENERGETIC ION BACKSCATTERING [J].
BORDERS, JA ;
PICRAUX, ST .
PROCEEDINGS OF THE IEEE, 1974, 62 (09) :1224-1231
[4]  
CHU WK, 1973, THIN SOLID FILMS, V77, P1
[5]   LOW-TEMPERATURE MIGRATION OF SILICON IN THIN LAYERS OF GOLD AND PLATINUM [J].
HIRAKI, A ;
NICOLET, MA ;
MAYER, JW .
APPLIED PHYSICS LETTERS, 1971, 18 (05) :178-&
[6]   ANALYSIS OF THIN-FILM STRUCTURES WITH NUCLEAR BACKSCATTERING AND X-RAY-DIFFRACTION [J].
MAYER, JW ;
TU, KN .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01) :86-93
[7]   SOLID-SOLID REACTIONS IN PT-SI SYSTEMS [J].
MUTA, H ;
SHINODA, D .
JOURNAL OF APPLIED PHYSICS, 1972, 43 (06) :2913-+
[8]   KINETICS AND MECHANISM OF PLATINUM SILICIDE FORMATION ON SILICON [J].
POATE, JM ;
TISONE, TC .
APPLIED PHYSICS LETTERS, 1974, 24 (08) :391-393
[9]   POROSITY IN SPUTTERED PLATINUM FILMS [J].
WESTWOOD, WD .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01) :466-471