DEPTH PROFILING USING THE GLANCING-INCIDENCE AND GLANCING-TAKEOFF X-RAY-FLUORESCENCE METHOD

被引:25
|
作者
TSUJI, K
SATO, S
HIROKAWA, K
机构
[1] Institute for Materials Research, Tohoku University, Aoba-ku Sendai 980
来源
REVIEW OF SCIENTIFIC INSTRUMENTS | 1995年 / 66卷 / 10期
关键词
D O I
10.1063/1.1146163
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We have developed a new analytical method, which we call the glancing-incidence and glancing-takeoff x-ray fluorescence (GIT-XRF) method. In this method, a fluorescent x ray is measured at various combinations of incident and takeoff angles. A nondestructive depth profiling is possible by using this GIT-XRF method, because the effective observation depth is changed by both the incident and takeoff angles. Here, we introduce the idea of depth profiling using the GIT-XRF method, and then we apply this method to an Au-Si interface reaction. (C) 1995 American Institute of Physics.
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页码:4847 / 4852
页数:6
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